Nanowerk News) Beneq announces the first hamlet day extinguished fashion Atomic Layer Deposition (ALD) experiment with effort commercially accessible, the TFS 200R. It has been designed after manage event interdependent to Roll-to-Roll ALD. In TFS 200R, the modifiable substrate is anchored on a cylinder. The cylinder is surrounded impending a horde of nozzles, each creating a indubitable gas department. This effort is profoundly expedient after concentrated experiment with of the day extinguished fashion ALD manage and is a should after all those who are bearing in class using ALD in a grave throughput Roll-to-Roll development. As the cylinder is rotated, the substrate passes from climb to bottom exact gas zones and is then coated. Roll-to-Roll ALD has recently acquired a fortune of value, signally as a method to synchronize grave grandeur moisture barriers after modifiable electronics.
The profoundly first hamlet TFS 200R was recently delivered to the Advanced Surface Technology Laboratory (ASTRaL) at Lappeenranta University of Technology (LUT) in Finland, where it serves as a experiment with effort to boning up nanotechnological coating solutions after the tatter determination.
Prof. The effort is supported impending the EU via TEKES, the Finnish Funding Agency after Technology and Innovation.
Beneq Oy, Vantaa, Finland, is a supplier of industrial organization and technology after far-reaching markets. David Cameron, LUT, says “The grave magnanimous of hop in the configuration of this childlike effort desire gratuity us to analyse the processing problems congenital in developing a roll-to-roll manage.” Sampo Ahonen, CEO of Beneq, continues, “Our childlike ALD experiment with effort desire accelerate the event of grave mass development Roll-to-Roll ALD applications after modifiable electronics and the tatter determination, and this desire asphalt the mode after grave throughput industrial Roll-to-Roll ALD solutions and organization.”
The entity of the experiment with effort at ASTRaL with the childlike TFS 200R effort is the integration of Atomic Layer Deposition into tatter determination applications, in aid with the tatter and packaging companies Stora-Enso and UPM Raflatac and the coating cast Savcor.
Beneq is turning innovations into good fortune impending providing nanotechnology enabled of concern coating applications after cleantech and renewable zip areas, signally in microscope spectacles, photovoltaics and emerging unconvincing films markets. Beneq solutions are based on Atomic Layer Deposition (ALD) and proprietary atmospheric nHALO® & nAEROTM aerosol coating technologies.